In this paper CADEP, a problem-oriented language for positioning geometric patterns in a two-dimensional space, is presented. Although the language has been specifically designed for the automatic generation of integrated circuit masks, it turns out to be well suited also for such other placement problems as architecture design, urban planning, logical and block diagram representation. The design criteria, the structure, and the specific features of CADEP are illustrated.
The Latest from CACM
Shape the Future of Computing
ACM encourages its members to take a direct hand in shaping the future of the association. There are more ways than ever to get involved.
Get InvolvedCommunications of the ACM (CACM) is now a fully Open Access publication.
By opening CACM to the world, we hope to increase engagement among the broader computer science community and encourage non-members to discover the rich resources ACM has to offer.
Learn More
Join the Discussion (0)
Become a Member or Sign In to Post a Comment