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How Three-Dimensional Transistors Went from Lab to Fab

Intel silicon channel

In Intels new design the silicon channel is raised like a fin, so the gate contacts it from three sides.

Technology Review

Intel's new three-dimensional transistor design, announced last week, is the culmination of more than a decade of research and development work that began in a lab at the University of California, Berkeley, in 1999.

From Technology Review
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